We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Ion plating equipment.
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Ion plating equipment Product List and Ranking from 4 Manufacturers, Suppliers and Companies

Ion plating equipment Product List

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Arc discharge type high vacuum ion plating device

A wide range of options from small devices exclusively for precision tools to large mass production types compatible with large molds!

The "Arc Discharge Type High Vacuum Ion Plating Device" is an ion plating device capable of forming extremely dense and smooth hard films. By utilizing a unique method, it enables film formation in high vacuum without the need for argon gas, allowing for the creation of dense and highly reactive films. It primarily focuses on the formation of titanium-based films, such as TiC and TiCN, which provide high hardness and smoothness, making it suitable for surface treatment of molds. It has a wealth of experience in surface treatment applications for automotive parts molds. The system can be flexibly customized according to the size and shape of the substrate and processing requirements. It offers a wide range of options, from compact devices dedicated to precision machining tools to large-scale production types suitable for large molds. 【Features】 ■ No discharge gas required ■ Smooth hard films can be formed (no polishing required after film formation) ■ Decorative films that can replace gold plating can be formed (gold, gray, brown) ■ Proven results not only in metal surface treatment and hard films (capable of handling electronic components, metal films, oxide films) *For more details, please download the PDF document or feel free to contact us.

  • Other physicochemical equipment

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Arc filament type ion plating device

High-speed formation of a dense oxide film with a thickness of up to 10 μm. Equipped with a newly developed ionization mechanism, a CVD alternative high-density ion plating device.

High-speed formation of dense and highly plasma-resistant yttria and SiC films. Achieves a denser film quality at lower temperatures than CVD and spray methods through a reactive process using high-density plasma. Realizes a clean film formation process applicable to semiconductor-related components. Easy maintenance and low cost due to the PVD method. High-speed formation of insulating films (oxide films and carbide films). High-speed formation of dense thick films. Overcomes the weaknesses of conventional ion plating methods. A state-of-the-art PVD system for creating new surface functionalities.

  • Plasma surface treatment equipment
  • Other processing machines
  • Evaporation Equipment

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Ion plating device "Jcoat -PVD-"

It is a cutting-edge cathodic arc ion plating device.

The ion plating device "Jcoat -PVD-" is a cutting-edge cathodic arc ion plating device among the PVD methods, which include vacuum deposition, sputtering, and ion plating. Additionally, we offer ion plating devices using the HCD hollow cathode method, which has a proven track record in the field of cutting tools, to meet our customers' diverse needs. 【Features】 ○ Low-temperature processing ○ Strong adhesion ○ Uniform coating ○ Composite and multilayer films possible ○ High-energy plasma (hollow cathode ion plating device) ○ Smooth coating (hollow cathode ion plating device) ○ TiCN coating (hollow cathode ion plating device) *For more details, please download the PDF or feel free to contact us.

  • Surface treatment contract service

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Hollow Cathode Ion Plating Device NTH-1000

Releasing argon gas from inside the hollow cathode, ionizing the inert gas and forming a discharge.

The discharge operation gas, argon gas, is released from inside the hollow cathode, ionizing this inert gas to form a discharge. For more details, please contact us or download the catalog.

  • Other processing machines

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Ion plating device for side electrodes (compatible with surface-mounted small components)

Dry formation of side electrodes for small electronic components (surface mount type). End face electrode deposition compatible with small components made possible by PVD (ion plating equipment).

Forming side electrodes of passive electronic components (resistors, capacitors) of the surface mount type using a dry process. A clean process that does not require waste liquid treatment. An electrode film is formed with strong adhesion only on the end faces of the components. Metal films such as Sn and Ni are formed with high throughput (also compatible with oxide film formation). We contribute to the drying and cost reduction of the production process for small electronic components, as well as stable production, through our proven hardware and unique film formation process.

  • Evaporation Equipment
  • Plasma surface treatment equipment
  • Other processing machines

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Arc discharge type ion plating device "SIA-400T"

It is equipped with a high-speed rotation mechanism for evaporation to reduce droplets.

The SIA-400T is a device that employs an upgraded arc discharge type, which generates an arc discharge on the surface of the evaporation source, going through the processes of melting, deposition, and ionization to form a "surface hardening film" and a "decorative film," making it ideal for tools, blades, molds, etc. 【Features】 ○ Minimizes waste and ensures processing capacity ○ No need for replenishment of the evaporation source for each batch ○ User-friendly device that makes substrate mounting easy ○ Achieves a bonding strength of over 70N for TiN films formed with this device ○ By changing the evaporation source, deposition of almost all metals is possible For more details, please contact us or download the catalog.

  • Other semiconductor manufacturing equipment

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Hollow Cathode Type Ion Plating Device SIH-400T

It is equipped with a high-speed rotating mechanism for evaporation to reduce droplets.

The Holocathode Ion Plating Device SIH-400T is ideal for depositing decorative films on accessories and hardening films on tools. By varying the amount and type of introduction gases (N2, O2, C2H2), it is possible to change the color of the deposited film. 【Features】 ○ Optimal for hardening film deposition on tools ○ Film deposition recipe control via touch panel operation ○ Ideal as a small-scale production machine or experimental machine For more details, please contact us or download the catalog.

  • Other semiconductor manufacturing equipment

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Ion Plating Device "SIP-1600"

For customers considering the drying and increased production of decoration and painting.

The ion plating device "SIP-1600" is a machine for depositing metal films onto resin substrates. It is capable of depositing two types of materials in the same batch. It comes with two internal jigs and carts, providing high productivity. The ion plating mechanism allows for smooth film deposition. 【Features】 ○ Depending on the size of the workpiece, either a 6-axis or 8-axis self-rotation jig can be installed. ○ The resistance heating evaporation source is equipped with switchable electrodes (2 sets). ○ An ion plating mechanism is included. ○ Two jig carts are standard equipment. ○ The installation of a refrigeration unit has improved the exhaust speed for H2O. For more details, please contact us or download the catalog.

  • Other semiconductor manufacturing equipment

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